Advance Semiconductor Metrology Forum(114.06.17)
發佈日期：2025/5/5 上午 12:00:00 ． 人氣指數：16
- 開課類別：技術
- 開課日期：2025/06/17(二) ~ 2025/06/17(二)
- 開課地點：新竹
- 費用：0
- 報名狀況：線上報名
- 課程簡章：
課程資訊
Advance Semiconductor Metrology Forum
09:00-17:00, June 17, 2025
Rm. 802, Bldg. 1, ITRI Kuang Fu Campus
The Advance Semiconductor Metrology Forum (ASMF) is an international platform dedicated to metrology in semiconductor manufacturing. As traditional measurement methods reach their limits, technologies like X-ray, optical scattering, electron microscopy, and AI-driven metrology are gaining prominence. ASMF brings together experts from industry, academia, and national institutes to discuss solutions for advanced nodes (2 nm and below). Key topics include metrology on material purity analysis, front-end processes, and advanced packaging. Through technical presentations and discussions, the forum fosters innovation, enhances efficiency, and improves semiconductor yield and competitiveness.
Tentative Program:
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Time
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Topic
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Speaker
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09:00-09:10
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Open remark
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Dr. Yu-Ping Lan, Director, CMS/ITRI
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Session I Advanced Metrology for Future Microelectronics Manufacturing
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09:10-09:35
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CD-SAXS for Critical Dimension Measurement in Advanced Semiconductors
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Dr. R Joseph Kline, NIST
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09:35-10:00
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Defect Classification and Composition Study by Photoluminescence in Compound Semiconductor & 2D materials
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Kosuke Matsumoto, HORIBA
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10:00-10:25
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The Development of Advanced Electron Microscopy in ITRI: What’s the Next Step?
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Dr. Shen-Chuan Lo, CMS/ITRI
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10:25-10:45
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Coffee Break
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Session II: Enabling Metrology for Integrating Components in Advanced Packaging
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10:45-11:10
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Advanced Imaging and Analysis at Nanoscale for Dimensional Nanometrology
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Dr. Shengkai Yu, NMC/A*star
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11:10-11:35
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The Metrology Pillar of Semiconductor Advanced Packaging: Precision Measurement of Vertical Structures in 3D IC
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Dr. Jen-Chieh Wang, OmniMeasure
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11:35-12:00
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Advance Package Failure Analysis and Challenge
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Charles Lin, Zeiss
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12:00-13:00
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Lunch
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Session III: Metrology for Materials Purity, Properties, and Provenance
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13:00-13:25
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Criticality of Integrated Microcontamination Control in Advanced Semiconductor Processes
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Dr. Po-Chia Chen, Entegris
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13:25-13:50
|
Material Property Characterization for Advanced EUV Lithography: Metrology Needs and Challenges
|
Dr. Ansoon Kim, KRISS
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13:50-14:15
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Future Prospects and Challenges of Chemical Analysis in Advanced Semiconductor Manufacturing Processes
|
Jones Hsu, BASF
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14:15-14:40
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Unveiling Material Secrets: Advanced Mass Spectrometry for Semiconductors Analysis
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Erin Hsiung, Sr Application Chemist, Waters
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14:40-15:00
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Coffee Break
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Session IV: Worldwide View of Semiconductor Metrology
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15:00-15:20
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Metrology Challenges for Emerging Semiconductors
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Dr. Fernando Castro, NPL
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15:20-15:35
|
TBD
|
Dr. Victoria Coleman, NMIA
|
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15:35-15:50
|
Advanced Materials Science and Technology - Opportunities and Challenges for Thailand
|
Dr. Jariya Buajarern, NMIT
|
|
15:50-16:05
|
TBD
|
TBD, NMIM-SIRIM
|
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16:05-16:20
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Demand and Challenges in Electromagnetics Metrology for the Semiconductor Industry
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Dr. Yusong Meng, NMC/A*star
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16:20-16:35
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TBD
|
Dr. Gonda Satoshi, NMIJ
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16:35-17:00
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Semiconductor Focus Group in APMP area
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Dr. Wei-En Fu, CMS/ITRI
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